THE USE OF ION BOMBARDMENT IN DEPOSITION OF EVAPORATINC THIN METAL FILMS ON GLASS
Cheng Zhengyong
DOI:10.11835/j.issn.1674-4764.1995.03.017
Received ,Revised , Accepted , Available online July 01, 2015
Volume ,1995,Pages 108-110
- Abstract
This paper presents a new method in the producton of glass deposition byevaporation,and the principle of ion bonibardment.The effect of ion bombardment to the filmadhesion is estimated by the observation of cross-sectiun sweep electron micrcocope.